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Atomic Layer Deposition for Semiconductors Softcover reprint of the original 1st ed. 2014 edition
Atomic Layer Deposition for Semiconductors
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.
273 pages, 89 black & white illustrations, 81 colour illustrations, 3 black & white tables, 1 colour
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2016. gada 23. augusts |
| ISBN13 | 9781489979438 |
| Izdevēji | Springer-Verlag New York Inc. |
| Lapas | 263 |
| Izmēri | 234 × 155 × 18 mm · 482 g |
| Valoda | Angļu |
| Redaktors | Hwang, Cheol Seong |