Pastāsti draugiem par šo preci:
The Source / Drain Engineering of Nanoscale Germanium-based MOS Devices - Springer Theses Zhiqiang Li 1st ed. 2016 edition
The Source / Drain Engineering of Nanoscale Germanium-based MOS Devices - Springer Theses
Zhiqiang Li
73 pages, 3 black & white illustrations, 49 colour illustrations, biography
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2016. gada 22. jūnijs |
| ISBN13 | 9783662496817 |
| Izdevēji | Springer-Verlag Berlin and Heidelberg Gm |
| Lapas | 59 |
| Izmēri | 155 × 235 × 12 mm · 310 g |
| Valoda | Vācu |