Pastāsti draugiem par šo preci:
Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics Chris R. Kleijn Softcover reprint of the original 1st ed. 1993 edition
Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics
Chris R. Kleijn
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.
140 pages, black & white illustrations
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2013. gada 20. novembris |
| ISBN13 | 9783034877435 |
| Izdevēji | Springer Basel |
| Lapas | 139 |
| Izmēri | 152 × 229 × 7 mm · 195 g |
| Valoda | Vācu |