Tell your friends about this item:
Plasma Charging Damage Kin P. Cheung 2001 edition
Plasma Charging Damage
Kin P. Cheung
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
346 pages, biography
| Media | Books Hardcover Book (Book with hard spine and cover) |
| Released | October 4, 2000 |
| ISBN13 | 9781852331443 |
| Publishers | Springer London Ltd |
| Pages | 346 |
| Dimensions | 155 × 235 × 20 mm · 657 g |
| Language | English |
See all of Kin P. Cheung ( e.g. Paperback Book and Hardcover Book )