Pastāsti draugiem par šo preci:
Plasma Charging Damage Kin P. Cheung 2001 edition
Plasma Charging Damage
Kin P. Cheung
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
346 pages, biography
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2000. gada 4. oktobris |
| ISBN13 | 9781852331443 |
| Izdevēji | Springer London Ltd |
| Lapas | 346 |
| Izmēri | 155 × 235 × 20 mm · 657 g |
| Valoda | Angļu |