Pastāsti draugiem par šo preci:
Plasma Charging Damage Kin P. Cheung Softcover reprint of the original 1st ed. 2001 edition
Plasma Charging Damage
Kin P. Cheung
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
364 pages, biography
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2012. gada 30. augusts |
| ISBN13 | 9781447110620 |
| Izdevēji | Springer London Ltd |
| Lapas | 346 |
| Izmēri | 157 × 234 × 19 mm · 522 g |
| Valoda | Angļu |