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Ion Implantation in Semiconductors: Science and Technology Susumu Namba Softcover reprint of the original 1st ed. 1975 edition
Ion Implantation in Semiconductors: Science and Technology
Susumu Namba
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974.
742 pages, 97 black & white illustrations, biography
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2013. gada 29. aprīlis |
| ISBN13 | 9781468421538 |
| Izdevēji | Springer-Verlag New York Inc. |
| Lapas | 742 |
| Izmēri | 178 × 254 × 38 mm · 1,30 kg |
| Valoda | Angļu |
| Redaktors | Namba, Susumu |