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Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies Oluwatobi Adeleke
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Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies
Oluwatobi Adeleke
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
496 pages, 102 Line drawings, black and white; 24 Halftones, black and white; 126 Illustrations, bla
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2023. gada 15. decembris |
| ISBN13 | 9781032386706 |
| Izdevēji | Taylor & Francis Ltd |
| Lapas | 354 |
| Izmēri | 150 × 220 × 20 mm · 662 g |
| Valoda | Angļu |
