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![Cover for Guilei Wang · Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses (Paperback Book) [2019 edition] (2020)](https://imusic.b-cdn.net/images/item/original/480/9789811500480.jpg?guilei-wang-2020-investigation-on-sige-selective-epitaxy-for-source-and-drain-engineering-in-22-nm-cmos-technology-node-and-beyond-springer-theses-paperback-book&class=scaled&v=1608791585)