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High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications Piotr Dudek
High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications
Piotr Dudek
I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2011. gada 23. decembris |
| ISBN13 | 9783838130187 |
| Izdevēji | Südwestdeutscher Verlag für Hochschulsch |
| Lapas | 112 |
| Izmēri | 150 × 7 × 226 mm · 176 g |
| Valoda | Angļu |
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