Pastāsti draugiem par šo preci:
Radio Frequency Sputtering: Thin-Film Deposition and Device Applications
Radio Frequency Sputtering: Thin-Film Deposition and Device Applications
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Tiks izlaists | 2026. gada 9. septembris |
| ISBN13 | 9783527356225 |
| Izdevēji | Wiley-VCH Verlag GmbH |
| Lapas | 432 |
| Izmēri | 150 × 220 × 20 mm · 680 g (Svars (aptuveni)) |
| Redaktors | Lim, Weon Cheol (Korea Institute of Science and Technology (KIST), South Korea) |
| Redaktors | Sharma, Aditya (University of Petroleum and Energy Studies (UPES), India) |
| Redaktors | Sharma, Poorva (Luzhou Vocational and Technical College, China) |
| Redaktors | Singh, Jitendra Pal (Manav Rachna University, India) |