Pastāsti draugiem par šo preci:
Ion Implantation and Annealing Applications, Science and Technology: Contributions from IIT School, Edition 2026 - Topics in Applied Physics
Ion Implantation and Annealing Applications, Science and Technology: Contributions from IIT School, Edition 2026 - Topics in Applied Physics
This book is a new, comprehensive, tutorial-style reference from the IIT2026 school that unifies ion implantation and annealing, guiding the reader from historical context and fundamental beam physics through to full process integration in advanced semiconductor manufacturing.
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2026. gada 4. septembris |
| ISBN13 | 9783032311726 |
| Izdevēji | Springer Nature Switzerland AG |
| Lapas | 776 |
| Izmēri | 150 × 220 × 20 mm · 1,28 kg |
| Valoda | Vācu |
| Redaktors | Current, Michael I. |
| Redaktors | Lerch, Wilfried |
Ziemassvētku dāvanas var atgriezt līdz 31. janvārim