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CMOS Plasma and Process Damage Kirk Prall
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CMOS Plasma and Process Damage
Kirk Prall
Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2025. gada 17. maijs |
| ISBN13 | 9783031890284 |
| Izdevēji | Springer International Publishing AG |
| Lapas | 466 |
| Izmēri | 150 × 220 × 20 mm · 891 g |
| Valoda | Vācu |
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