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Simulation of Deposition Processes with PECVD Apparatus Juergen Geiser
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Simulation of Deposition Processes with PECVD Apparatus
Juergen Geiser
Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to implant or deposit thin layers of important materials.
144 pages, Illustrations
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2012 |
| ISBN13 | 9781621003656 |
| Izdevēji | Nova Science Publishers Inc |
| Lapas | 144 |
| Izmēri | 162 × 234 × 14 mm · 352 g |
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