Pastāsti draugiem par šo preci:
Interconnect Noise Optimization in Nanometer Technologies Mohamed Elgamel 1st Ed. Softcover of Orig. Ed. 2006 edition
Interconnect Noise Optimization in Nanometer Technologies
Mohamed Elgamel
Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect Provides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits
160 pages, 1, black & white illustrations
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2010. gada 29. oktobris |
| ISBN13 | 9781441938442 |
| Izdevēji | Springer-Verlag New York Inc. |
| Lapas | 160 |
| Izmēri | 156 × 234 × 8 mm · 235 g |
| Valoda | Angļu |