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EUV Sources for Lithography - Press Monographs Vivek Bakshi
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EUV Sources for Lithography - Press Monographs
Vivek Bakshi
An authoritative reference book on EUV source technology. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation.
1094 pages
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2006. gada 28. februāris |
| ISBN13 | 9780819496256 |
| Izdevēji | SPIE Press |
| Lapas | 1094 |
| Izmēri | 150 × 220 × 10 mm · 1,63 kg (Svars (aptuveni)) |
![Cover for Michael A. Mueller · Introduction to Confocal Fluorescence Microscopy - Tutorial Texts (Paperback Book) [Second edition] (2005)](https://imusic.b-cdn.net/images/item/original/431/9780819460431.jpg?michael-a-mueller-2005-introduction-to-confocal-fluorescence-microscopy-tutorial-texts-paperback-book&class=scaled&v=1692768712)