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Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering W. N. G. Hitchon
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Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering
W. N. G. Hitchon
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
232 pages, 31 b/w illus. 2 tables 33 exercises
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 1999. gada 28. janvāris |
| ISBN13 | 9780521591751 |
| Izdevēji | Cambridge University Press |
| Lapas | 232 |
| Izmēri | 180 × 259 × 18 mm · 650 g |
| Valoda | Angļu |
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