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Sub-Half-Micron Lithography for ULSIs Katsumi Suzuki
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Sub-Half-Micron Lithography for ULSIs
Katsumi Suzuki
This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.
344 pages, 103 b/w illus. 43 tables
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2005. gada 10. novembris |
| ISBN13 | 9780521022347 |
| Izdevēji | Cambridge University Press |
| Lapas | 344 |
| Izmēri | 188 × 247 × 23 mm · 666 g |
| Valoda | Angļu |
| Redaktors | Matsui, Shinji (Nano-scale Science and Technology Group, Himeji Institute of Technology) |
| Redaktors | Ochiai, Yukinori (NEC Corporation, Tsukuba, Japan) |
| Redaktors | Suzuki, Katsumi (NEC Corporation, Tsukuba, Japan) |
