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Computational Lithography - Wiley Series in Pure and Applied Optics Xu Ma
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Computational Lithography - Wiley Series in Pure and Applied Optics
Xu Ma
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
226 pages, Illustrations
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 2010. gada 6. augusts |
| ISBN13 | 9780470596975 |
| Izdevēji | John Wiley & Sons Inc |
| Lapas | 256 |
| Izmēri | 160 × 241 × 18 mm · 508 g |
| Valoda | Angļu |
