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Chemical Vapour Deposition (CVD): Advances, Technology and Applications - Series in Materials Science and Engineering 1. izdevums
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Chemical Vapour Deposition (CVD): Advances, Technology and Applications - Series in Materials Science and Engineering
This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.
398 pages
| Mediji | Grāmatas Paperback Book (Grāmata ar mīksto vāku un līmēto muguru) |
| Izlaists | 2021. gada 31. marts |
| ISBN13 | 9780367780111 |
| Izdevēji | Taylor & Francis Ltd |
| Lapas | 398 |
| Izmēri | 150 × 220 × 10 mm · 734 g |
| Valoda | Angļu |
| Redaktors | Choy, Kwang-Leong (University of Nottingham, UK) |
