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Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan)
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Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology
Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan)
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
356 pages, 2 colour plates, 5 halftones, numerous line figures
| Mediji | Grāmatas Hardcover Book (Grāmata ar cieto muguriņu un vāku) |
| Izlaists | 1998. gada 28. maijs |
| ISBN13 | 9780198562870 |
| Izdevēji | Oxford University Press |
| Lapas | 356 |
| Izmēri | 163 × 242 × 23 mm · 743 g |
| Valoda | Angļu |